OpticNano Consulting

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OPTICNANO eurl

10, allée du Chateau 

  38240 Meylan-France

mobile: (+33)688701450

Email: info@opticnano.eu

Skype: opticnano

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OPTICNANO Consulting EURL.

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In situ real time film growth monitoring with your smart Phone...!!

FS4smart
Easy to handle even from your desktop and no computer need.. the FS-1 ellipsometer is a very compact  and light ( lees than 500 grams,  13x6x6 centimeters boxes, two heads source / detector small size boxes that  you only need to fix on your cluster tool deposition or growth system such as ALD, CVD  or film PVD cluster tools.  You will then follow in real time and be able to monitor your system from your office with  your tablet  or smartphone (windows or android or apple).. Easy mounting in most  optical windows designs without breaking vacuum.. and even here no workstation or PC laptop needed!!!

Such a light setting can be used as well on top of any other processing configuration  like Langmuir Blodgett , (LB)trough,  water surfactants controls, TIRE experiments or porosimetry , ect... and getting much more accuracy than usual instruments.

WP 20160302 16 45 29 Pro LI

To be followed  : Fs-1 with  an  IoT server with a low cost driver card server interface....

 Multi-Wavelength Ellipsometers

for Thin Film Measurements


 

FS1Pic01The new Band Wavelength Ellipsometer (BWE) excels at measuring the thickness and index of transparent single films, in the thickness range from 0 to 1000 nm. Measurements on semitransparent and absorbing films, and 2 - 3 layer films are also possible.

Semiconductor: oxides and nitrides, high/low k dielectrics, amorphous and poly Si, photoresists Optical Coatings: high and low index films a-Si films, organic films (for OLED technology)

Data Storage industry: DLC films.Process R&D: in situ characterization of film deposition, for MBE, CVD,ALD, sputtering,

Chemistry and Biology: detection of sub-monolayer material adsorption in-line monitoring and controlIndustrial

Compact, light weight Can be installed without breaking chamber vacuum for 

Realtime monitoring and control of film thickness

aldcycle

Study growth dynamics, nucleation, interfaces Characterize Dep. Rates vs. process parameters in a single 0 50 100 150 200 250 300 350 400 run, without breaking vacuum!.

 

    For Europe Quotes and   Documentation ,  information

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Scatterometry

GGratingScatterometry models for IC design CD data

More News..

Here will be  Future developpments...

EuV Projects

Thick SiO2 on silicon substrate sample  Ellipsometry data ( Experiments : SE UV Ellipsometer at LETI . (unpublished 2008)

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